Modeling 3D ICP Plasma

Inductively Coupled Plasma (ICP) Reactors are widely used in semiconductor manufacturing to efficiently generate high density plasma for wafer processing

Watch this application-specific 45-minute webinar where we showcase ESI's multi-physics solutions used to model ICP chambers including various asymmetric's in geometry and complexity in chemistry.

Key Takeaways 

• High-fidelity 3D simulation incorporating chamber, coil and wafer geometric complexity
• Parametric design space exploration including coil design, Faraday shield placement. power, pressure, flowrate and plasma chemistry
• ICP reactors performance optimization and process calibration