Semiconductor Manufacturing: Optimizing Chamber Design and Process Parameters with Complex Plasma Chemistry Models

Semiconductor Manufacturing: Optimizing Chamber Design and Process Parameters with Complex Plasma Chemistry Models
Taiwan
April 14th 7:00PM PT | April 15th 10:00AM TST
1 hour
Simulations of industrial low-temperature plasmas are often challenging due to the use of complex plasma chemistry, especially in the presence of multiple gases in the feedstock mixture. This webinar will showcase examples of 2D/3D Inductively Coupled and Capacitively Coupled plasma simulations in such gas mixtures.
   
Subject Matter Experts:
Ananth Bhoj: Principle Technical manager at ESI with over 15 years of experience in developing plasma models
Abhra Roy: Technical Business Development Manager, with over 15 years experience in modeling and simulations for plasma and thin-film modeling​​​​​​ 

 

Registrations are now closed - A new date will be communicated shortly.

KEY TAKEAWAYS

  • How to build plasma reactions for real gas mixtures
  • See usage of 0D model for mechanism reduction and process space exploration
  • Learn best practices in model set up for high simulation fidelity and faster convergence
  • Visualize source functions, reaction pathways, ion energy and angular distributions
  • How to quickly import plasma gas phase chemistry mechanisms in Chemkin format